In order to observe the quality of produced micro and nanostructures the TDSU 1 operates different state of the art analysing tools.
The microscope serves as non-destructive, optical investigation technique. Two DM4M optical microscopes with different objectives are available in the cleanroom.
- Dry Plan Apochromatic Objectives 2.5x ... 150x (NA 0.9), 6-position objective nosepiece
- Upright trinocular tube, eye piece 10x/25
- Koehler illumination for transmitted and reflected light, mixed illumination possible
- Yellow illumination for UV sensitive materials
- Linearly polarized illumination
- Bright field and dark field microscopy
- Full color camera system MC170HD 5MPx
- Sample stage (manual) with 4"x4" travelling range and open area
A contact stylus profilometer is a tactile investigation technique for the analysis of step heights, shapes and roughness on a sample. This tool offers a 2D profiling (line scan) of the surface by moving a stylus in contact mode over the sample for a specified distance and with a specified contact force.
- Vertical range: 1200 µm, scan length: 30 mm
- Low force measurements at 0.03 to 15 mg
- Tip radius 2µm, opening angle 60°
- High resolution 5 MP color camera with 4x digital zoom for sample positioning
- Manual levelling, software levelling
- Table diameter 140mm, travelling range 20mm/80mm, 360° rotation
- Samples from a few mm size up to 4“ wafers and sample thickness up to 20 mm
Atomic force microscopy is especially well suited for high resolution imaging of very smooth surfaces. A cantilever with a nanometer sharp tip scans over a surface. The forces between the tip and the sample surface lead to a deflection of the cantilever. Depending on the measurement mode different information could be extracted such as surface topography or force-distance curves.
- Measurement modes: Static force microscopy, lateral force microscopy, dynamic force microscopy, spectroscopy, lithography, phase contrast microscopy
- Vertical resolution: 70 pm
- Maximum field size: 100x100 µm
- Measurable aspect ratios up to 10:1
- Sample sizes up to 50 x 50 x 5 mm
Ellipsometry is a non-destructive, optical investigation technique for thin film characterization. For this tool the change of polarization upon reflection is measured and compared to a model. This analysis allows the characterization of optical constants and layer thickness.
- Spectroscopic ellipsometer for the wavelength range 450nm...850nm
- Ellispometric angles Delta Δ and Psi ψ or Mueller Matrix Polarimetry (full Mueller Matrix)
- Isotropic, anisotropic and depolarizing samples, transparent samples
- Measurement spot size 25 x 60 µm ... 500 x 500 µm
- Motorized stage, sample size up to 6", sample thickness up to 5mm
- Additional camera system for sample alignment and positioning
- Elaborate software package Horiba DeltaPsi2 for advanced thin film analysis