The microscope serves as non-destructive, optical investigation technique. Two DM4M optical microscopes with different objectives are available in the cleanroom.
Dry Plan Apochromatic Objectives 2.5x ... 150x (NA 0.9), 6-position objective nosepiece
Upright trinocular tube, eye piece 10x/25
Koehler illumination for transmitted and reflected light, mixed illumination possible
Yellow illumination for UV sensitive materials
Linearly polarized illumination
Bright field and dark field microscopy
Full color camera system MC170HD 5MPx
Sample stage (manual) with 4"x4" travelling range and open area
A contact stylus profilometer is a tactile investigation technique for the analysis of step heights, shapes and roughness on a sample. This tool offers a 2D profiling (line scan) of the surface by moving a stylus in contact mode over the sample for a specified distance and with a specified contact force.
Vertical range: 1200 µm, scan length: 30 mm
Low force measurements at 0.03 to 15 mg
Tip radius 2µm, opening angle 60°
High resolution 5 MP color camera with 4x digital zoom for sample positioning
Manual levelling, software levelling
Table diameter 140mm, travelling range 20mm/80mm, 360° rotation
Samples from a few mm size up to 4“ wafers and sample thickness up to 20 mm
Atomic force microscopy is especially well suited for high resolution imaging of very smooth surfaces. A cantilever with a nanometer sharp tip scans over a surface. The forces between the tip and the sample surface lead to a deflection of the cantilever. Depending on the measurement mode different information could be extracted such as surface topography or force-distance curves.
Measurement modes: Static force microscopy, lateral force microscopy, dynamic force microscopy, spectroscopy, lithography, phase contrast microscopy
Vertical resolution: 70 pm
Maximum field size: 100x100 µm
Measurable aspect ratios up to 10:1
Sample sizes up to 50 x 50 x 5 mm
Horiba Auto SE
Ellipsometry is a non-destructive, optical investigation technique for thin film characterization. For this tool the change of polarization upon reflection is measured and compared to a model. This analysis allows the characterization of optical constants and layer thickness.
Spectroscopic ellipsometer for the wavelength range 450nm...850nm
Ellispometric angles Delta Δ and Psi ψ or Mueller Matrix Polarimetry (full Mueller Matrix)
Isotropic, anisotropic and depolarizing samples, transparent samples
Measurement spot size 25 x 60 µm ... 500 x 500 µm
Motorized stage, sample size up to 6", sample thickness up to 5mm
Additional camera system for sample alignment and positioning
Elaborate software package Horiba DeltaPsi2 for advanced thin film analysis
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